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MICRO-CHEM SU-8 Developer 显影剂光刻胶

microchemSU-8Developer显影剂Microchem SU-8 developer显影剂是一个高对比度,环氧基光刻胶专为微加工和微电子等的应用需要的厚胶,化学和热稳定的图像.入有需要具【详细】

MICRO-CHEM SU-8 3050 光刻胶

SU-8 3050 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

MICRO-CHEM SU-8 3035 光刻胶

SU-8 3035 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

MICRO-CHEM SU-8 3025

SU-8 3025 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

MICRO-CHEM SU-8 3010

SU-8 3010 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

MICRO-CHEM SU-8 2050

SU-8 2050 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

MICRO-CHEM SU-8 2015

SU-8 2015 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

MICRO-CHEM SU-8 2002

SU-8 2002 is best suited for permanent applications where it is imaged, cured and left on the device【详细】

MICRO-CHEM SU-8 2010

SU-8 2010 is a high contrast, epoxy based photoresist designed for micromachining and other microele【详细】

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